Deposition of silicon dioxide films on amorphous carbon films by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics
- 3 March 1997
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 70 (9) , 1078-1079
- https://doi.org/10.1063/1.118490
Abstract
No abstract availableKeywords
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