Silica film preparation by chemical vapor deposition using vacuum ultraviolet excimer lamps
- 14 December 2000
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 168 (1-4) , 37-40
- https://doi.org/10.1016/s0169-4332(00)00574-2
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Silent-discharge driven excimer UV sources and their applicationsApplied Surface Science, 1992
- Silicon precipitation in a surface layer of SiO2 by high-power vacuum ultraviolet laser irradiationSurface Science, 1991
- Surface alterations of SiO2 optics by 9.8 and 8.5 eV laser photonsJournal of Non-Crystalline Solids, 1990
- High-power narrow-band operation and Raman frequency conversion of an electron-beam pumped krypton excimer laserIEEE Journal of Quantum Electronics, 1988