High-quality ZnO films prepared on Si wafers by low-pressure MO-CVD
- 29 April 2003
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 433 (1-2) , 131-134
- https://doi.org/10.1016/s0040-6090(03)00327-4
Abstract
No abstract availableKeywords
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