Preparation of crystallized zinc oxide films on amorphous glass substrates by pulsed laser deposition

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Abstract
Zinc oxide (ZnO) films with c‐axis orientation have been prepared on glass substrates by pulsed laser deposition with an ArF excimer laser. The fluctuations of c‐axis orientation of the ZnO films are evaluated by full width at half‐maximum (FWHM) of the rocking curve of the x‐ray diffraction. The ZnO films with a FWHM of 1.9° can be obtained on the optimum conditions (substrate temperature of 500–600 °C, O2 gas pressure of 2–6×10−4 Torr) even at a thickness of 200 nm. We have observed the crystallization of the ZnO during film formation by using in situ reflection high energy electron diffraction. It is confirmed that ZnO thin films with a thickness of up to about 50 nm have c‐axis orientation on the glass substrates.