Single pulse nm-size grating formation in polymers using laser ablation with an irradiation wavelength of 355 nm

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Abstract
Laser ablation at 355 nm of a specially designed polymer was used as a true single step dry-etching process to create a two-beam interference grating. Gratings with groove spacings of 180 and 1090 nm were created with single laser pulses. Moreover, by varying the laser fluence and/or the angle between the two beams, variable modulation frequencies (depth/spacing) could be obtained. Additional pulses deteriorated the grating quality, demonstrating the importance of the single pulse approach.