Demonstration of Multiprocessing by Silicon Epitaxy Following In-Situ Cleaning

Publisher Website

1 January 1991

journal article
Published by Springer Nature in MRS Proceedings

Vol. 224
https://doi.org/10.1557/proc-224-273

Abstract

No abstract available

Keywords

This publication has 2 references indexed in Scilit:

Advanced epitaxial Si and GexSi1−x multiprocessing for semiconductor device technologies
Journal of Materials Research, 1990
Gas-phase selective etching of native oxide
IEEE Transactions on Electron Devices, 1990