An investigation of the effects of the molecular weight distribution on the sensitivity of positive electron resists
- 1 September 1976
- journal article
- research article
- Published by Wiley in Journal of Applied Polymer Science
- Vol. 20 (9) , 2367-2375
- https://doi.org/10.1002/app.1976.070200907
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Electron beam processing systems (a state of the art review)Polymer Engineering & Science, 1974
- High-resolution Positive Resists for Electron-beam ExposureIBM Journal of Research and Development, 1968