Electron beam processing systems (a state of the art review)
- 1 July 1974
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 14 (7) , 516-517
- https://doi.org/10.1002/pen.760140710
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Computer-controlled resist exposure in the scanning electron microscopeIEEE Transactions on Electron Devices, 1972
- Epoxide-Containing Polymers as Highly Sensitive Electron-Beam ResistsJournal of the Electrochemical Society, 1971
- Polymeric Electron Beam ResistsJournal of the Electrochemical Society, 1969
- Electron Beam Exposure of SiliconesJournal of the Electrochemical Society, 1969
- Electron Resists for Microcircuit and Mask ProductionJournal of the Electrochemical Society, 1969
- Exposure of Photoresists: Electron Beam Exposure of Negative PhotoresistsJournal of the Electrochemical Society, 1969
- High-resolution Positive Resists for Electron-beam ExposureIBM Journal of Research and Development, 1968