Soft Magnetic Properties of Highly Resistive Co-Al-N Alloy Films.

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Abstract
The effects of AI and N concentration on the structure and properties of Co.95Fe.05-Al-N films, prepared by RF reactive magnetron sputtering with (N2+Ar) gases, have been studied. TEM observation reveals that nitrided films are composed of heterogeneous phases with a very fine network structure. It was found that the properties of films were determined mainly by the combination of Al and N concentrations. The coercivity of the films containing more than 10 at% Al decrease with increasing N content, even when the film thickness is more than 2μm. A steep increase in the resistivity and a slight decrease in the magnetization of films containing more than 15 at% Al are observed during the initial increase in the N concentration, and both resistivity and magnetization decrease rapidly when the N concentration is the same as that of Al. These anomalies are attributed to intergranular materials, indicating the presence of an Al-N rich-phase in these films.

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