Drift of the breakdown voltage in p-n junctions in silicon (walk-out)
- 31 August 1977
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 20 (8) , 689-695
- https://doi.org/10.1016/0038-1101(77)90045-4
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Avalanche injection into the oxide in silicon gate-controlled devices—II. Experimental resultsSolid-State Electronics, 1975
- Avalanche injection into the oxide in silicon gate-controlled devices—I theorySolid-State Electronics, 1975
- Electron trapping at positively charged centers in SiO2Applied Physics Letters, 1975
- Avalanche-injected electron currents in SiO2 at high injection densitiesSolid-State Electronics, 1974
- Hole Currents in Thermally Grown SiO2Journal of Applied Physics, 1972
- Emitter avalanche currents in gated transistorsIEEE Transactions on Electron Devices, 1972
- On the emitter degradation by avalanche breakdown in planar transistorsSolid-State Electronics, 1971
- On the mechanism of hFE degradation by emitter-base reverse current stressMicroelectronics Reliability, 1970
- Avalanche drift instability in planar passivated p-n junctionsIEEE Transactions on Electron Devices, 1968
- The origin of channel currents associated with P+regions in siliconIEEE Transactions on Electron Devices, 1965