Dynamics of patterned laser-induced chemical vapor deposition

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Abstract
An expression for the grating growth rate in laser-induced chemical vapor deposition is derived which incorporates the contribution from the plasmon field intensity. It is found that the ultimate grating height is independent of laser intensity, while the grating growth rate is linear in intensity. For the shallow grating case the expression reduces to exponential growth. Also discussed are several possible mechanisms which account for the periodic structure.