A new self-aligning process for whole-wafer tunnel junction fabrication
- 1 March 1989
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 25 (2) , 1123-1126
- https://doi.org/10.1109/20.92487
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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