Laser-Induced Etching
- 1 January 1987
- book chapter
- Published by Elsevier
Abstract
No abstract availableThis publication has 100 references indexed in Scilit:
- Photoelectrochemical etching of compound semiconductors: Wavelength dependenceApplied Physics A, 1985
- Temperature rise induced by a cw laser beam revisitedJournal of Applied Physics, 1985
- Submicrometer patterning by projected excimer-laser-beam induced chemistryJournal of Vacuum Science & Technology B, 1985
- Ablative photodecomposition of polymer films by pulsed far‐ultraviolet (193 nm) laser radiation: Dependence of etch depth on experimental conditionsJournal of Polymer Science: Polymer Chemistry Edition, 1984
- UHV preparation of organic overlayers by a molecular beam techniqueApplications of Surface Science, 1984
- Direct etching of polymeric materials using a XeCl laserApplied Physics Letters, 1983
- Ablative photodecomposition: action of far-ultraviolet (193 nm) laser radiation on poly(ethylene terephthalate) filmsJournal of the American Chemical Society, 1982
- Fabrication and investigation of thin-film CdSxSe1–xwaveguidesSoviet Journal of Quantum Electronics, 1982
- Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laserApplied Physics Letters, 1982
- A melting model for pulsing-laser annealing of implanted semiconductorsJournal of Applied Physics, 1979