Chemical bonding and electronic structure ofSi
- 15 November 1980
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 22 (10) , 4784-4790
- https://doi.org/10.1103/physrevb.22.4784
Abstract
The chemical bonding and electronic properties of Si have been investigated by measuring ultraviolet photoemission spectroscopy and Auger electron spectroscopy transitions involving both core and valence electrons for Pd, Si, and Si. The spectra have been interpreted based on partial state densities calculated for Pd-Si compounds. In the silicide, the states of the Pd interact strongly with the states of the Si. The resulting hybrid complex is composed of Pd states lying almost entirely below with the central peak at - 2.75 eV and two groups of Si states separated by ∼5 eV. The lower-lying group of Si states forms the Si -Pd bonding levels, while the higher-lying group near forms the corresponding antibonding states. The compound stoichiometry can change the position of the peak as well as the occupation of the antibonding states, thus affecting the phase stability of the compound. Such stoichiometry variations are consistent with filling of the complex in an almost rigid-band-like manner. The results obtained in this study can be used to account for the transport properties of Si.
Keywords
This publication has 18 references indexed in Scilit:
- Microscopic Basis of Miedema's Empirical Theory of Transition-Metal Compound FormationPhysical Review Letters, 1980
- Microscopic Compound Formation at the Pd-Si(111) InterfacePhysical Review Letters, 1979
- Chemical and structural properties of the Pd/Si interface during the initial stages of silicide formationJournal of Vacuum Science and Technology, 1979
- Partial densities of states in amorphousPhysical Review B, 1979
- Cohesive properties of metallic compounds: Augmented-spherical-wave calculationsPhysical Review B, 1979
- Quasiatomic Auger Spectra in Narrow-Band MetalsPhysical Review Letters, 1977
- Surface spectroscopy of Schottky-barrier formation on Si(111) 7 × 7: Photoemission studies of filled surface states and band bendingPhysical Review B, 1976
- Characterization of polycrystalline layers by channelling measurementsThin Solid Films, 1973
- Structure and electrical characteristics of epitaxial palladium silicide contacts on single crystal silicon and diffused P-N diodesSolid-State Electronics, 1972
- Metallurgical properties and electrical characteristics of palladium silicide-silicon contactsSolid-State Electronics, 1971