Low-Temperature STM Images of Methyl-Terminated Si(111) Surfaces
- 16 September 2004
- journal article
- letter
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry B
- Vol. 109 (2) , 671-674
- https://doi.org/10.1021/jp047672m
Abstract
Low-temperature scanning tunneling microscopy (STM) has been used to image CH3-terminated Si(111) surfaces that were prepared through a chlorination/alkylation procedure. The STM data revealed a well-ordered structure commensurate with the atop sites of an unreconstructed 1 x 1 overlayer on the. silicon (111) surface. Images collected at 4.7 K revealed bright spots, separated by 0.18 +/- 0.01 nm. which are assigned to adjacent H atoms on the same methyl group. The C-H bonds in each methyl group were observed to be rotated by 7 +/- 3degrees away froth the center of an adjacent methyl group and toward. an underlying Si atom. Hence, the predominant interaction that determines the surface structure arises from repulsions between hydrogen atoms oil neighboring methyl groups, and secondary interactions unique to the surface are also evident.This publication has 16 references indexed in Scilit:
- In Search of Perfection: Understanding the Highly Defect-Selective Chemistry of Anisotropic EtchingAnnual Review of Physical Chemistry, 2003
- Diels−Alder Reactions of Anthracenes with Dienophiles via Photoinduced Electron TransferThe Journal of Physical Chemistry A, 2003
- Organometallic Chemistry on Silicon and Germanium SurfacesChemical Reviews, 2002
- Photoreactivity of Unsaturated Compounds with Hydrogen-Terminated Silicon(111)Langmuir, 2000
- Synthesis and Characterization of DNA-Modified Silicon (111) SurfacesJournal of the American Chemical Society, 2000
- Fully methylated, atomically flat (111) silicon surfaceSurface Science, 2000
- A New Opportunity in Silicon-Based MicroelectronicsScience, 1998
- Determination of the bonding of alkyl monolayers to the Si(111) surface using chemical-shift, scanned-energy photoelectron diffractionApplied Physics Letters, 1997
- Alkyl Monolayers on Silicon Prepared from 1-Alkenes and Hydrogen-Terminated SiliconJournal of the American Chemical Society, 1995
- Unusually Low Surface-Recombination Velocity on Silicon and Germanium SurfacesPhysical Review Letters, 1986