Surface passivation of silicon with the Plasmodul®
- 31 July 2001
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 142-144, 771-775
- https://doi.org/10.1016/s0257-8972(01)01180-x
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Optimization and characterization of remote plasma-enhanced chemical vapor deposition silicon nitride for the passivation of p-type crystalline silicon surfacesJournal of Vacuum Science & Technology A, 1998
- Duo-Plasmaline — a linearly extended homogeneous low pressure plasma sourceSurface and Coatings Technology, 1997