Relation between Plasma Parameters and Film Properties in DC Reactive Magnetron Sputtering of Indium-Tin-Oxide
- 1 July 1997
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 36 (7S)
- https://doi.org/10.1143/jjap.36.4922
Abstract
The dc magnetron sputtering process of an indium-tin-oxide (ITO) target in Ar/O2 is studied. Experimental results from laser induced fluorescence measurements of sputtered indium atoms, optical emission measurements of various atomic and molecular species in the excited states, probe measurements of plasma ion density and potential, and measurements of deposited film properties (transmittance, resistivity and deposition rate) are reported. Effects of the preset pressure of introduced O2 on these parameters are investigated over a wide range of preset pressures.Keywords
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