Stress in Very Thin Chromium Electrodeposits
- 1 January 1966
- journal article
- Published by Taylor & Francis in Transactions of the IMF
- Vol. 44 (1) , 105-110
- https://doi.org/10.1080/00202967.1966.11869991
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- The Effect of the Underlying Metal on the Internal Stress and Formation of Microcracks in Electrodeposited ChromiumTransactions of the IMF, 1965
- The Relation between Cracking and Internal Stress in Microcracked Chromium DepositsTransactions of the IMF, 1964
- Coating thickness measurement by electron probe microanalysisBritish Journal of Applied Physics, 1963
- Internal Stress and Cracking in Electrodeposited ChromiumTransactions of the IMF, 1963
- The Measurement of Internal Stress in ElectrodepositsTransactions of the IMF, 1963
- Measurement of Stress In Very Thin ElectrodepositsJournal of the Electrochemical Society, 1961
- An Instrument for the Continuous Measurement of Stress in ElectrodepositsTransactions of the IMF, 1956
- A spiral contractometer for measuring stress in electrodepositsJournal of Research of the National Bureau of Standards, 1949
- A Theory for the Mechanism of Chromium Plating; A Theory for the Physical Characteristics of Chromium PlateTransactions of The Electrochemical Society, 1947
- Differences in the structure of electrodeposited metallic coatings shown by X-ray diffractionTransactions of the Faraday Society, 1935