A novel approach for the study of the migration of Cl− ions in anodic alumina
- 1 August 1999
- journal article
- Published by Elsevier in Corrosion Science
- Vol. 41 (9) , 1835-1847
- https://doi.org/10.1016/s0010-938x(99)00018-9
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- The behaviour of chromium species incorporated into anodic oxide films on bismuthCorrosion Science, 1996
- Anodic oxide films on tantalum: Incorporation and mobilities of electrolyte-derived speciesPhilosophical Magazine Part B, 1996
- Intermolecular exchange in a triarylborane-phosphine complex: a multinuclear magnetic resonance studyPhilosophical Transactions A, 1994
- Direct observations of ion-implanted xenon marker layers in anodic barrier films on aluminiumThin Solid Films, 1982
- Nonsimultaneous Place Exchange: A Microscopic High Field Transport Mechanism in SolidsJournal of the Electrochemical Society, 1980
- Mobility of Metallic Foreign Atoms during the Anodic Oxidation of AluminumJournal of the Electrochemical Society, 1974
- The Use of Rutherford Backscattering to Study the Behavior of Ion-Implanted Atoms During Anodic Oxidation of Aluminum: Ar, Kr, Xe, K, Rb, Cs, Cl, Br, and lJournal of the Electrochemical Society, 1973
- Transport Numbers of Metal and Oxygen during the Anodic Oxidation of TantalumJournal of the Electrochemical Society, 1973
- The Migration of Oxygen during the Anodic Oxidation of TantalumJournal of the Electrochemical Society, 1973
- The Migration of Metal and Oxygen during Anodic Film FormationJournal of the Electrochemical Society, 1965