Current transport phenomena in SiO2 films
- 16 August 1976
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 36 (2) , 591-595
- https://doi.org/10.1002/pssa.2210360219
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Electrical Conduction and Dielectric Breakdown in Silicon Dioxide Films on SiliconJournal of the Electrochemical Society, 1972
- Electronic properties of amorphous dielectric filmsThin Solid Films, 1967
- Fowler-Nordheim tunneling in SiO2 filmsSolid State Communications, 1967
- Single carrier transport in thin dielectric filmsThin Solid Films, 1967
- SPACE-CHARGE-LIMITED IONIC CURRENTS IN SILICON DIOXIDE FILMSApplied Physics Letters, 1967
- Noncrystalline Structure and Electronic Conduction of Silicon Dioxide FilmsPhysica Status Solidi (b), 1967
- A non-filamentary switching action in thermally grown silicon dioxide filmsBritish Journal of Applied Physics, 1967
- Electronic conduction in thermally grown silicon dioxide filmsBritish Journal of Applied Physics, 1967
- Ion Transport Phenomena in Insulating FilmsJournal of Applied Physics, 1965
- Charge storage effects in silicon dioxide filmsIEEE Transactions on Electron Devices, 1965