Fowler-Nordheim tunneling in SiO2 films
- 1 October 1967
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 5 (10) , 813-815
- https://doi.org/10.1016/0038-1098(67)90715-6
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Barrier energies in metal-silicon dioxide-silicon structuresJournal of Physics and Chemistry of Solids, 1966
- Photoemission of Electrons from Metals into Silicon DioxideJournal of Applied Physics, 1966
- Experimental Determination ofRelationship in Electron TunnelingPhysical Review Letters, 1966
- General Relationship for the Thermal Oxidation of SiliconJournal of Applied Physics, 1965
- Photoemission of Electrons from Silicon into Silicon DioxidePhysical Review B, 1965
- Tunneling from Metal to SemiconductorsPhysical Review B, 1965