A limited reaction processor with plasma capability
- 28 February 1990
- journal article
- Published by Elsevier in Microelectronics Journal
- Vol. 21 (1) , 29-34
- https://doi.org/10.1016/0026-2692(90)90005-n
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Minority-carrier properties of thin epitaxial silicon films fabricated by limited reaction processingJournal of Applied Physics, 1986
- Temperature transients in heavily doped and undoped silicon using rapid thermal annealingJournal of Applied Physics, 1985
- The SIS tunnel emitter: A theory for emitters with thin interface layersIEEE Transactions on Electron Devices, 1979