Feasibility and electrical properties of 600 °C thermal silica layers for thin film transistor applications
- 1 March 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 197 (1-2) , 21-27
- https://doi.org/10.1016/0040-6090(91)90217-l
Abstract
No abstract availableKeywords
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