Contributions of Gas Phase Reactions to CVD Processes
- 1 January 1988
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- On the Reaction Mechanism of the Pyrolyses of TMG and TEG in MOCVD Growth ReactorsJapanese Journal of Applied Physics, 1987
- A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition ReactorJournal of the Electrochemical Society, 1984
- Modeling and Analysis of Low Pressure CVD ReactorsJournal of the Electrochemical Society, 1983
- Low pressure deposition of polycrystalline silicon from silaneJournal of Crystal Growth, 1981
- Properties of Epitaxial Gallium Arsenide from Trimethylgallium and ArsineJournal of the Electrochemical Society, 1973
- The Role of Homogeneous Reactions in Chemical Vapor DepositionJournal of the Electrochemical Society, 1971