Effect of the pressure on the chemical vapor deposition of copper from copper hexafluoroacetylacetonate trimethylvinylsilane
- 1 August 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 305 (1-2) , 254-258
- https://doi.org/10.1016/s0040-6090(97)00160-0
Abstract
No abstract availableKeywords
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