Nitride film deposition by femtosecond and nanosecond laser ablation in low-pressure nitrogen discharge gas
- 1 February 2000
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 154-155, 165-171
- https://doi.org/10.1016/s0169-4332(99)00381-5
Abstract
No abstract availableKeywords
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