Low-energy electron-diffraction determination of the structure of successively deposited ordered layers of Cd on Ti(0001). I. The first layer

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Abstract
The successive stages of the deposition of Cd onto a clean Ti(0001) surface are studied by Auger electron spectroscopy (AES) and low-energy electron diffraction (LEED). Completion of successive layers of Cd up to the fourth is recognized by study of the AES and LEED spectra as a function of exposure. The atomic arrangement in the first layer is determined by the methods of LEED crystallography. The Cd atoms are not located in the hexagonal-close-packed positions that would be occupied by Ti atoms if the substrate were to grow, but are rather located in the face-centered-cubic positions with respect to the first two substrate layers. The distance between the Cd overlayer and the top Ti layer is 2.57 Å—somewhat more than the interlayer spacing in bulk Ti (2.34 Å) but less than the same in bulk Cd (2.81 Å) corresponding to a bond length of Cd to Ti of 3.08 Å.