Chemical and Thermal Stability of Fluorinated Amorphous Carbon Films for Interlayer Dielectric Applications
- 1 January 1999
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectricsApplied Physics Letters, 1996
- Diamondlike Carbon Materials as Low-k Dielectrics for Multilevel Interconnects in UlsiMRS Proceedings, 1996
- Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectricsJournal of Applied Physics, 1995