High sensitivity positive tone x-ray resist: RAY-PF-performance under e-beam exposure
- 31 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4) , 571-574
- https://doi.org/10.1016/0167-9317(89)90122-6
Abstract
No abstract availableKeywords
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- Photocatalytic novolak-based positive resist for X-ray lithography - kinetics and simulation -Microelectronic Engineering, 1987
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