Photocatalytic novolak-based positive resist for X-ray lithography - kinetics and simulation -
- 1 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4) , 503-509
- https://doi.org/10.1016/0167-9317(87)90080-3
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Highly-sensitive novolak-based positive X-ray resistMicroelectronic Engineering, 1986
- Application of the simulator “XMAS” on specific problems in sub-half-micron lithographyMicroelectronic Engineering, 1985
- Theory of conduction in polysilicon: Drift-diffusion approach in crystalline-amorphous-crystalline semiconductor system—Part I: Small signal theoryIEEE Transactions on Electron Devices, 1984
- Effect of Substituent Groups on Hydrogen Bonding of Polyhydroxystyrene DerivativesPolymer Journal, 1983
- Mechanism and Catalysis for the Hydrolysis of Acetals, Ketals, and Ortho EstersPublished by Wiley ,1967
- An Algorithm for Least-Squares Estimation of Nonlinear ParametersJournal of the Society for Industrial and Applied Mathematics, 1963