Kinetics and properties of chemically vapour-deposited tungsten films on silicon substrates
- 1 July 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 52 (2) , 181-194
- https://doi.org/10.1016/0040-6090(78)90137-2
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- High Resolution Tungsten Patterning Using Buffered, Mildly Basic Etching SolutionsJournal of the Electrochemical Society, 1975
- Kinetics of the Chemical Vapor Deposition of TungstenJournal of the Electrochemical Society, 1973
- Electrochemical Delineation of Tungsten Films for Microelectronic DevicesJournal of the Electrochemical Society, 1971
- The Si-Wsi[sub 2]-Si Epitaxial StructureJournal of the Electrochemical Society, 1967
- Vapor Deposition of Tungsten by Hydrogen Reduction of Tungsten HexafluorideJournal of the Electrochemical Society, 1967