Process dependence of hole trapping in thin nitrided SiO/sub 2/ films
- 1 November 1989
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 36 (11) , 2447-2451
- https://doi.org/10.1109/16.43665
Abstract
No abstract availableKeywords
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