General problems of high resolution lithography
- 1 October 1986
- Vol. 36 (10) , 649-653
- https://doi.org/10.1016/0042-207x(86)90334-9
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Sputtering of a polymer layer deposited on metal substratesJournal of Applied Physics, 1983
- Self-developing resist with submicrometer resolution and processing stabilityApplied Physics Letters, 1983
- Dry development of ion beam exposed PMMA resistJournal of Vacuum Science and Technology, 1982
- Polymethyl methacrylate sensitivity variation versus the electronic stopping power at ion lithography exposureApplied Physics Letters, 1981