Thermal oxidation of β-Ta below 500 °C
- 1 November 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 86 (1) , 21-30
- https://doi.org/10.1016/0040-6090(81)90154-1
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- An SiO2-Ta2O5Thin Film CapacitorIEEE Transactions on Parts, Hybrids, and Packaging, 1973
- Factors controlling the structure of sputtered Ta filmsThin Solid Films, 1973
- X-ray analysis of sputtered films of beta-tantalum and body-centered cubic tantalumThin Solid Films, 1972
- Study of the Competitive Diffusion at 525 °C of Nitrogen and Oxygen in Sputtered β-Tantalum FilmsJournal of Vacuum Science and Technology, 1972
- Thermal Oxidation of Sputtered Tantalum Thin Films between 100° and 525°CJournal of Applied Physics, 1969
- Structure des Oxides de TantaleJapanese Journal of Applied Physics, 1967
- Stress Generation in Tantalum During OxidationJournal of the Electrochemical Society, 1963
- The Oxidation of Sputtered Tantalum FilmsJournal of the Electrochemical Society, 1962