Noncontact Technique for the Local Measurement of Semiconductor Resistivity

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Abstract
A method is described for finding the local resistivity of a semiconductor crystal by measuring the radio frequency spreading resistance of a small probe placed on a flat surface of the sample. The method is nondestructive and does not require the attachment of electrical contacts. The resistivity measured is that of the material lying within a hemisphere of about 1 mm radius; measurements have been made over the range 0.1–100 Ω cm with good accuracy above 0.5 Ω cm.