Amorphization of germanium crystals during ion bombardment

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Abstract
Germanium single crystal amorphization doses Da , during bombardment with 30 keV ions of different species (5⩽Zi;⩽83)are determined by a high energy electron diffraction method. The experimental dependence of the amorphization dose on ion atomic number is compared with the theoretical one, obtained on the assumption that the amorphous layer is formed as a result of an increase in the number and dimensions of microscopic amorphous zones produced by the bombarding ions. The character changes of the diffraction patterns for the lightest ions with dose differs from that for heavier ions. The temperature dependence of the amorphization dose for phosphorous ion bombardment in the range 10 °C ⩽ T ⩽ 250 °C is measured and compared with existing theories.