Characterization of Homoepitaxial Diamond Films Grown from Carbon Monoxide
- 1 October 1993
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 32 (10R)
- https://doi.org/10.1143/jjap.32.4661
Abstract
The crystallinities and electrical properties of homoepitaxial diamond films grown from carbon monoxide have been investigated. The films were grown on high-pressure synthesized diamond (100) and (111) substrates by microwave plasma chemical vapor deposition, and were characterized by means of atomic force microscopy, reflection high-energy electron diffraction, cathodoluminescence, secondary electron microscopy and Hall effect measurement. The (100) films were smooth, whereas films grown on the (111) substrate became rough. The boron-doped (100) film also exhibited Hall mobility of 451 cm2/Vs.Keywords
This publication has 20 references indexed in Scilit:
- Effect of Ambient on the Surface Resistance of Diamond Films during Cooling after DepositionJapanese Journal of Applied Physics, 1992
- Cathodoluminescence from Epitaxial Diamond Layer Grown by Plasma-Assisted Chemical Vapor Deposition on High-Pressure Synthetic DiamondJapanese Journal of Applied Physics, 1992
- The characterisation of point defects in diamond by luminescence spectroscopyDiamond and Related Materials, 1992
- Epitaxially Grown Diamond (001) 2×1/1×2 Surface Investigated by Scanning Tunneling Microscopy in AirJapanese Journal of Applied Physics, 1991
- Detailed surface and gas-phase chemical kinetics of diamond depositionPhysical Review B, 1991
- Effect of Electron and Neutron Irradiation on the Cathodoluminescence of Nitrogen-Doped CVD DiamondJapanese Journal of Applied Physics, 1990
- Growth of Device-Quality Homoepitaxial Diamond Thin FilmsMRS Proceedings, 1989
- Properties of CVD Diamond/Metal InterfaceMRS Proceedings, 1989
- Epitaxial Growth of Diamond and Diamond DevicesMRS Proceedings, 1989
- High-Field Magnetoresistance of Semiconducting DiamondPhysical Review B, 1972