Silicon oxide films deposited by excimer laser chemical vapour deposition
- 1 December 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 193-194, 619-626
- https://doi.org/10.1016/0040-6090(90)90213-w
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Laser-induced chemical vapour deposition and characterization of amorphous silicon oxide filmsThin Solid Films, 1988
- Laser-induced chemical vapor deposition of hydrogenated amorphous silicon. I. Gas-phase process modelJournal of Applied Physics, 1987
- Low-temperature growth of silicon dioxide films: A study of chemical bonding by ellipsometry and infrared spectroscopyJournal of Vacuum Science & Technology B, 1987
- Theoretical and experimental investigations on the deposition rate and processes of parallel incident laser-induced CVDApplied Physics A, 1985
- Laser-induced chemical vapor deposition of SiO2Applied Physics Letters, 1982