Deep light ion lithography in PMMA — A parameter study
- 1 November 1997
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 132 (3) , 430-438
- https://doi.org/10.1016/s0168-583x(97)00449-7
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Production of buried waveguides in PMMA by high energy ion implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1995
- Infrared transmission of ion irradiated polymersRadiation Effects and Defects in Solids, 1994
- Chemical modification of PMMA by MeV and GeV, light and heavy, ion irradiationsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1994
- Irradiation of PMMA with high energy light ions: The depth distribution for volatile reaction-product emissionRadiation Effects and Defects in Solids, 1994
- 3D integration of refractive microoptical components by deep proton irradiationPure and Applied Optics: Journal of the European Optical Society Part A, 1993
- Improvement of surface properties of polymers by ion implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1993
- SIMS investigation of ion implanted PMMANuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- Compositional Changes of PMMA Layers during15N BombardmentPhysica Status Solidi (a), 1989
- Ion-beam sensitivity of polymer resistsJournal of Vacuum Science and Technology, 1981
- Ion Beam Exposure of Resist MaterialsJournal of the Electrochemical Society, 1979