Deposition of thick TEOS PECVD silicon oxide layers for integrated optical waveguide applications
- 1 December 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 334 (1-2) , 60-64
- https://doi.org/10.1016/s0040-6090(98)01117-1
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- LPCVD silicon-rich silicon nitride films for applications in micromechanics, studied with statistical experimental design*Journal of Vacuum Science & Technology A, 1996
- Development of a Cluster Tool and Analysis of Deposition of Silicon Oxide by TEOSO2 PECVDMRS Proceedings, 1996
- Measurement of the Effect of Temperature on Stress Distribution and Deformation in Multilayer Optical Thin Film StructuresMRS Proceedings, 1994
- Parameter fitting in grazing incidence x-ray reflectometryJournal of Applied Physics, 1993
- Low loss Si_3N_4–SiO_2 optical waveguides on SiApplied Optics, 1987
- Algorithms for the rapid simulation of Rutherford backscattering spectraNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Concepts of Backscattering SpectrometryPublished by Elsevier ,1978
- Silicon nitride films on silicon for optical waveguidesApplied Optics, 1977
- Surface Studies of Solids by Total Reflection of X-RaysPhysical Review B, 1954