Electrical and optical properties of vanadium-related centers in silicon
- 15 December 1991
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 44 (23) , 12809-12814
- https://doi.org/10.1103/physrevb.44.12809
Abstract
Vanadium-doped silicon was investigated using junction space-charge techniques. Three energy levels were observed at -0.21 eV (A level), -0.48 eV (B level), and +0.36 eV (C level). The enthalpies of electron capture are 4 and 16 meV for the A and B levels, respectively. The corresponding enthalpy of holes is 88 meV for the C level. It is believed that electron capture into the A and B levels is due to a cascade process. Changes in the Gibbs free energy as a function of temperature were calculated for all three levels. The good agreement of the Gibbs free energies with the optical threshold energies suggests negligible lattice relaxations. A structure in the low-energy part of the spectral distribution of the electron photoionization cross sections of the B level is assumed to be due to excited states and shown to be in good agreement with effective-mass theory.
Keywords
This publication has 17 references indexed in Scilit:
- Electrical and optical properties of titanium-related centers in siliconPhysical Review B, 1991
- Electric-field-enhanced electron emission from isolated sulfur and selenium donors in siliconPhysical Review B, 1990
- Line spectrum of the interstitial iron donor in siliconApplied Physics Letters, 1988
- Observation ofresonant states and Fano resonances of the deep gold acceptor in siliconPhysical Review B, 1987
- Photo-admittance spectroscopySolid State Communications, 1983
- Fundamentals of junction measurements in the study of deep energy levels in semiconductorsJournal of Physics E: Scientific Instruments, 1981
- Eigensehaften der Dotierungsniveaus von Mangan und Vanadium in SiliziumPhysica Status Solidi (a), 1981
- Thermodynamical analysis of optimal recombination centers in thyristorsSolid-State Electronics, 1978
- Fast capacitance transient appartus: Application to ZnO and O centers in GaP p-n junctionsJournal of Applied Physics, 1974
- Determination of deep energy levels in Si by MOS techniquesApplied Physics Letters, 1972