Relation between product yield and plasma process induced damage
- 27 November 2002
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
The impact of plasma process induced damage (charging) on the yield of products in 75-120 /spl Aring/ CMOS processes has been analyzed. It was shown that product yield loss is related to the threshold voltage shift of charging sensitive test structures and thus to charging. A simple model is introduced in which the charging related yield loss component of products is expressed by the attributes of antennas and the extent of charging. The proposed model is found to predict charging related yield loss using only one process dependent parameter, as is shown for various products.Keywords
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