Extending the Lifetime of Optical Lithography Technologies with Wavefront Engineering
- 1 December 1994
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 33 (12S)
- https://doi.org/10.1143/jjap.33.6765
Abstract
Various types of phase shifting mask, off-axis illumination, optical proximity correction and other innovations promise to extend the lifetime of i-line (365 nm) and deep ultra-violet (DUV) optical lithography technologies into the subhalf-micron era. No single innovation seems likely to produce a patterning paradigm that lasts more than one generation, but engineering solutions using combinations of new options and familiar technologies may make optical technology viable well into the next century.Keywords
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