TiN as a high temperature diffusion barrier for arsenic and boron
- 1 September 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 119 (1) , 11-21
- https://doi.org/10.1016/0040-6090(84)90153-6
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- TiN as a diffusion barrier in the Ti-Pt-Au beam-lead metal systemThin Solid Films, 1979