Study of temperature-dependent ultrathin oxide growth on Si(111) using variable-angle spectroscopic ellipsometry
- 1 January 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 193-194, 312-317
- https://doi.org/10.1016/s0040-6090(05)80040-9
Abstract
No abstract availableKeywords
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