Neutral radical deposition from silane discharges

This publication has 25 references indexed in Scilit:

• Dominant reaction channels and the mechanism of silane decomposition in a H2-Si(s)-SiH4 glow discharge
  Plasma Chemistry and Plasma Processing, 1987
• Excitation of the 1$s_5$,1$s_4$, 1$s_3$, and 1$s_2$ levels of argon by low-energy electrons
  Physical Review A, 1986
• Model for Columnar Microstructure of Thin Solid Films
  Physical Review Letters, 1986
• Reactions of SiH2(X̄1A1) with H2, CH4, C2H4, SiH4 and Si2H6 at 298 K
  Chemical Physics Letters, 1985
• Anisotropic scattering of electrons byN2and its effect on electron transport
  Physical Review A, 1985
• The 147-nm photolysis of monosilane
  Journal of the American Chemical Society, 1979
• Rate constants for the reaction of hydrogen and deuterium atoms with silane
  The Journal of Physical Chemistry, 1977
• Rate constants for the reactions of hydrogen atoms with some silanes and germanes
  The Journal of Physical Chemistry, 1977
• Hydrogen-atom initiated decomposition of monosilane
  The Journal of Physical Chemistry, 1976
• Radiolysis of Methane in a Wide-Range Radiolysis Source of a Mass Spectrometer. I. Individual and Total Cross Sections for the Production of Positive Ions, Negative Ions, and Free Radicals by Electrons
  The Journal of Chemical Physics, 1967