Test chip for the characterization of electron beam measurement systems
- 31 March 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 16 (1-4) , 225-232
- https://doi.org/10.1016/0167-9317(92)90342-o
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Methods for proximity effect correction in electron lithographyJournal of Vacuum Science & Technology B, 1990
- Test specimens for SEM voltage contrastMicroelectronic Engineering, 1985