Time-resolved measurements of highly polymerized negative ions in radio frequency silane plasma deposition experiments
- 1 February 1994
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 75 (3) , 1340-1353
- https://doi.org/10.1063/1.356413
Abstract
No abstract availableThis publication has 67 references indexed in Scilit:
- Modeling and measurements of the negative ion flux from amplitude modulated rf dischargesJournal of Applied Physics, 1992
- Kinetics of particle formation in the sputtering and reactive ion etching of siliconJournal of Vacuum Science & Technology A, 1992
- Cross-sections for the formation of negative ions by electron impact on silaneInternational Journal of Mass Spectrometry and Ion Processes, 1991
- Simulation of pulsed electropositive and electronegative plasmasIEEE Transactions on Plasma Science, 1991
- Analysis of low pressure rf glow discharges using a continuum modelJournal of Applied Physics, 1990
- Corona spray pyrolysis: A new coating technique with an extremely enhanced deposition efficiencyThin Solid Films, 1984
- Positive and negative ions in silane and disilane multipole dischargesInternational Journal of Mass Spectrometry and Ion Processes, 1984
- Negative ions of polyatomic molecules.Environmental Health Perspectives, 1980
- Mutual neutralization of simple and clustered positive and negative ionsThe Journal of Chemical Physics, 1978
- An appraisal of the mass spectrometer diagnostic technique in the study of afterglow plasmasJournal of Physics D: Applied Physics, 1973