Low-pressure chemical vapor deposition of titanium and zirconium carbonitride thin films from M(NEt2)4 (M = Ti and Zr)
- 1 April 1993
- journal article
- Published by Elsevier in Materials Letters
- Vol. 16 (4) , 194-199
- https://doi.org/10.1016/0167-577x(93)90162-q
Abstract
No abstract availableKeywords
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