Electrical characterization of very-low energy (0-30 eV) CI-Radical/Ion-beam-etching induced damage using two-dimensional electron gas heterostructures
- 1 January 1992
- journal article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 21 (1) , 3-7
- https://doi.org/10.1007/bf02670913
Abstract
No abstract availableKeywords
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